Peroxidase-Like Behavior of Ni Thin Films Deposited by Glancing Angle Deposition for Enzyme-Free Uric Acid Sensing

References

ref title DOI material type comment
4074 888 Peroxidase-Like Behavior of Ni Thin Films Deposited by Glancing Angle Deposition for Enzyme-Free Uric Acid Sensing https://doi.org/10.1021/acsomega.9b04071 Others Ni films deposited onto a silicon wafer by glancing angle deposition (GLAD)

Materials

ref material size size err size unit size type size comment BET b nanozyme b 10n b unit specific act sa 10n sa unit comment
8083 888 GLAD Ni film 610 nm SEM The final thickness of the Ni GLAD film was 610 nm as measured on a cleaved sample in a cross-sectional view by scanning electron microscopy (SEM, Hitachi S-4800).

Kinetics

ref material enzyme type substrate pH T km km err km 10n km unit vmax vmax err vmax 10n vmax unit kcat kcat err kcat 10n kcat unit kcat/km kcat/km 10n kcat/km unit comment
6796 888 GLAD Ni film POD TMB 5 RT 1.07 mM 888

Applications

ref material application target method linear range linear ran unit LOD lod unit recovery comment
5814 888 GLAD Ni film Colorimetric Sensing of Uric Acid. Uric Acid Color 15−500 μM 3.3 μM